Fluxless Sn-Ag Solder Joints between Silicon and Ag-Cladded Copper with Reliability Evaluations--MEJ
A fluxless bonding process between silicon and copper using Sn-rich Ag-Sn-Au multilayer composite has been developed.
The copper substrate is plated with a silver layer as stress buffer. We bond 5mm x 5mm silicon chips onto Ag/copper
substrates using electroplated lead-free Ag-Sn-Au solder. Electroplating method becomes an attractive deposition technique
in that thicker films can be fabricated. It also has an economical advantage over vacuum deposition technique. To achieve
high quality joint with few voids,a fluxless bonding process is developed in vacuum environment (50 militorrs) to suppress
tin oxidation. Comparing to bonding in air,the oxygen content is reduced by a factor of 15,200. Nearly void-free solder joints
are made. Initial joints comprising of three distinct layers of Sn-rich layer,Ag3Sn intermetallic compound,and Ag layer have
been achieved. Microstructure and composition of the joint are studied using optical microscope and Scanning Electron
Microscope (SEM) with energy dispersive X-ray spectroscopy (EDX). This technique becomes an innovative success for
overcoming the very large mismatch in thermal expansion between silicon of 3x10-6ppm/°C and copper of 17x10-6ppm/°C.
To evaluate the reliability of the solder joint and the bonded structure,samples will go through thermal cycling test and
failure modes will be evaluated in the future. Microstructural changes of the solder joints during thermal cycling test will be
investigated and assessed. Based on the results obtained,design recommendation can be made for producing joints with high
re-melting temperature.