CO2 technology offers electronic device manufacturers a robust platform for a variety of precision cleaning and machining
applications. Surface and substrate contamination such as flux residues,organics,particulate matter,outgassing residues,
ionic residues,and laser and mechanical machining heat can be addressed (uniquely) with this technology. Available CO2
processes include one or a combination of composite jet sprays,centrifugal liquid immersion,supercritical fluid extraction,
and both vacuum and atmospheric plasma surface treatments.
CO2 technology eliminates or significantly reduces both lean and green waste generation at the production operation level
(source) by modifying manufacturing processes such as precision cleaning and machining. Because it is safe and dry,CO2
technology can integrate directly into manufacturing processes and tools to provide in-situ cleaning and/or thermal control.
CO2 technology can be implemented in a variety of process configurations to meet the constraints of lean production layouts
and product flow requirements,including direct integration into existing production lines and equipment where the surface
contamination is being generated. CO2 is a very unique manufacturing agent that affords multiple cost reduction and
performance improvement opportunities for electronic device fabrication.
Exemplary applications include silicone contamination removal from a surface using a CO2 composite spray,hybrid CO2
particle-plasma pad surface preparation for gold wire bonding,ceramic flip chip defluxing using centrifugal liquid CO2,
surface residue removal using a CO2 composite spray following laser processing,particle removal from a CMOS image
sensor following wire bonding,and CO2-enabled laser machining of organic and ceramic substrates.