Process Improvement Strategies for Weak Microvia Interfaces
The industry has been openly discussing the concern about weak microvia interfaces after IR reflow and the potential for an undetected open or latent defect that can escape after expensive components have been soldered to the board. A specific concern is for the reliability of stacked microvia designs on very complex panels that are often built-in low volumes. This type of build is typical of American and European OEMs who are using large and expensive BGA components in mission critical electronics. Due to the limited number of units made, this board segment of the industry is more vulnerable to weak interface failure than the HDI boards for mobile devices that are made with high levels of automation in mass production by fabricators in Asia. Further complicating the board design impact, the metallization process that is used can have very different reliability performance from different lines in different regions.
The goal for the metallization process is to form a continuous metallurgical structure to withstand the thermo-mechanical stress of IR reflow during assembly. The best condition consists of epitaxial growth of a thin electroless copper deposit on the target pad with a grain structure that recrystallizes with temperature and becomes indistinguishable from the target pad and electrolytic copper structures. There are multiple factors that influence the ability to form this recrystallized structure, which in turn affects the strength of the microvia interface. These include the circuit design, laminate material selection, type and settings of laser via formation, post-laser conditioning of the target pad copper, the desmear and electroless copper process processes, and the electrolytic copper via fill plating processes.
Through extensive auditing as a supplier of primary metallization and electrolytic copper via fill chemistries, and cooperative work with PCB fabricator customers to improve microvia reliability, a wide range of studies were conducted. Presented in this paper are potential areas of concern for microvia reliability with a specific focus on metallization processes and the factors stated above as well as testing on improvements. The approach taken includes low level DOE testing for process improvement as measured by a test panel using IPC TM-650 2.6.26A and TM-650 2.6.27, otherwise known as IST and simulated IR reflow testing. Experience in failure analysis techniques, limitations on some commonly utilized inspection methods, and a review of overall best practices for plating are also discussed.
Testing was augmented with SEM, FIB, and broad-beam Ion Milling techniques to evaluate various the various structures. Current induced or air to air thermal cycling were utilized to determine the level of microvia survivability and judge process improvements.