Various requirements have developed for printed wiring boards regarding the minimum spacing between features.
Creepage distances per UL-60950 call out 1.2mm for voltages up to 50v,and call out 1.4mm for voltages up to
100v,for products classified under pollution degree2 material group IIIa. IEC-664 has an altitude factor that needs
to be added for any product that is designed to go over 2000m altitude (for 3000m product there is an additional 14
percent). Tyco has established rules,which do not allow spacing on a product to go below certain minimums,
depending upon the class of product. The UL-1012 sets spacing limits for power supplies. Telcordia GR-78,Section
13.1.5,specifies minimum 10 megohms (10E+10 ohms) after 1,000 hours at 85 ?C,85% RH,and 100 VDC bias as
their minimum standard for electrochemical migration resistance testing for an expected 25 year minimum product
life requirement.
For many years Sun Microsystems has required a minimum 0.035 inches from drilled hole wall edge to drilled hole
wall edge for adjacent component holes,and minimum 0.025 inches from drilled hole wall edge to drilled hole wall
edge for adjacent through-hole vias,for certain standard voltage requirements. These standards for electrochemical
migration resistance between internal features or the printed wiring board,also known as resistance to conductive
anodic filament growth or "CAF" resistance,were based upon earlier AT&T data and actual experience by Sun
Microsystems with products in the field. Today more and more boards are being designed with relatively high I/O
PBGA packages,and associated with these devices are fairly dense arrangements of through-hole vias. The
increases in trace routing density are also driving higher via density. New connectors are being developed which
have higher pin density and/or need to carry higher voltages. As a result of these trends,there is strong interest in
more accurately evaluating the corresponding electrochemical migration or CAF reliability risk for a variety of
component and via plated-through hole-to-hole spacing.
The following paper documents some of the difficulties faced in developing a temperature/humidity/bias test and
data analysis methodology for comparing the electrochemical migration or CAF resistance of various standard and
alternate printed wiring board (PWB or PCB Fab) la minate materials. These findings should be of interest to those
evaluating material,design,and process effects on electrochemical migration resistance. Please note that this
electrochemical migration paper focuses on CAF formation,not surface dendritic growth.