Reliable copper interconnects are a primary requirement for most printed wiring board applications. A variety of
wet manufacturing processes play an important role in the formation of durable interconnects,including plated thru
hole (PTH) metallization with electroless copper/electrolytic copper plate. PTH interplane (IP) separation may
become an issue when cleanliness and texturing of the IP before electroless deposition is not optimal. Smear
removal pretreatment and subsequent processing to provide a clean and properly textured IP before electroless
deposition have a strong influence on the resulting roughness and chemical content of the outermost layer of copper
surfaces. A method by which to evaluate the surface state of copper during each preclean and chemical processing
step would be beneficial to understanding copper surface chemistry,and consequently,some of the origins of IP
separation.
The tendency for a metal surface such as copper to undergo electrochemical corrosion can provide some qualitative,
as well as limited quantitative information on the relative state of the copper surface after exposure to various
corrosive solutions. For example,copper precleaning solutions,including permanganate desmear and acid
conditioning,are inherently corrosive and are required in order to generate a properly textured clean surface free of
contaminates upon which electroless copper can successfully adhere. The relative corrosivity of the solution the
copper is exposed to during preclean will ultimately affect the corrosion rate or corrosion resistance of the surface
when exposed to yet another corrosive electrolyte. For example,a relatively corrosive preclean step such as sodium
persulfate microetch may leave the copper surface in a more rough,oxidized state than a simple acidified rinse.
Consequently,it could be expected that the corrosion rate of this oxidized copper surface would be relatively low in
comparison to the corrosion rate of a smooth,pure copper surface afforded by a gentler acid rinse. Because IP
separation is a manifestation of poor adhesion between the base copper/ electroless copper or the electroless
copper/electrolytic copper interface,a more detailed investigation of the chemical factors that cause changes in
copper surfaces can be helpful in understanding the underlying cause(s).
With this objective in mind,a copper clad test vehicle was subjected to desmear and electroless copper plate along
with the associated precleans,with a portion of it removed,rinsed and dried after exposure to each individual
chemical processing step. The corrosion behavior of each resulting sample surface was electrochemically studied by
generating Tafel plots of each surface in 0.3% NaCl electrolyte. Corrosion rates of each unique copper surface after
various wet process steps and the corrosion potential of each surface in electrolyte are reported.